I started with a ship full of max-level veterans, and I'm just a complete noob.

The next morning, Lao Sun pressed the processed rotary table into the base and continued assembling the angle turntable.

On the other side, Jiang Ming divided the remaining middle section of the fifth furnace into eight positions, polished and measured the surface of each section, and then marked the beginning and end according to the original growth direction of the crystal column.

The temporary Laue apparatus used the same exposure conditions as the third film.

After each shot, Fang Xudong would develop the film in the darkroom and then write the negative number, sample position, and axis of symmetry direction into the same table.

After eight films were laid out on the worktable, the [111] principal axis of the five crystal segments deviated from the center line of the shape by less than one degree, two segments by two to three degrees, and the segment closest to the middle and the tail of the crystal segment reached five degrees.

Jiang Ming matched the numbering of the five-dimensional film with that of the previous high-dispersion slice. The cutting position, polarization extinction angle, and Laue principal axis direction matched each other, thus connecting the originally scattered device data into a complete position chain.

"Use this sealed-off piece as a counterexample. Start by cutting three sections within one degree in the first batch." He drew the correction direction on the edges of the three negatives and handed the angle values ​​to Lao Sun.

The precision cutting turntable consists of a thick steel base, a rotary disk with engraving lines, and a double-sided locking mechanism. The crystal column is clamped between soft metal shims, and the rotary disk is tightened simultaneously by two bolts after calibration.

Old Sun first used a standard square to check the zero position, then tightened, loosened, and reset the bolts. He did this several times in a row, controlling the hysteresis of the graduation line to be around ±0.5 degrees.

The gaps between the scribing lines and bolts still limit the ability to further improve positioning. However, compared to the previous method of relying on the outer circle of the crystal pillar for alignment, this turntable can now directly compensate for a spindle deflection of three to five degrees.

When the first crystal was mounted on the turntable, Jiang Ming adjusted the rotary disk to 0.7 degrees according to the Laue film, Lao Sun tightened the bolts alternately from both sides, and Fang Xudong used a square to cover the end face of the crystal column.

The diamond wire saw cuts along the set crystal plane, and the coolant flows down the cut. Lao Sun keeps the feed handwheel in place to keep the load on the saw wire within the range of the previous process.

Four slices were cut from each of the three crystal segments, for a total of twelve slices. After grinding and polishing, the slices were placed back under a polarizing microscope, and the extinction direction was concentrated within the same small scale segment.

Fang Xudong rearranged the sample order and retested, and the twelve sets of readings remained consistent. He wrote the angle of each crystal plane in the upper left corner of the device card and then handed it over to the point contact device group.

To retain a single variable, the twelve devices continued to use the stylus pressure, electrical pulse amplitude, and duration determined in the previous round, and the tungsten wire tips were also ground sequentially from the same batch of materials.

Old Sun installed the spring brackets one by one, Da Liu connected them to form a loop, Fang Xudong recorded the electrical pulses on the paper tape, and Jiang Ming only stopped the process for inspection when the current crossed the process window. The entire process was executed according to the original card.

After the last device was connected to the DC test terminal, Fang Xudong filled in the forward resistance, reverse resistance and breakdown data column by column, and then connected the twelve devices to the simple mixer test bench.

The intermediate frequency output responded sequentially, and the conversion loss readings were concentrated in a narrow range. Fang Xudong copied the data onto graph paper and recalculated the maximum, minimum and average values ​​within the group.

The forward and reverse resistance ratio dispersion dropped to 6%, and the mixing conversion loss dispersion was reduced to less than 4%. The previous batch of wide bars with a dispersion of more than 40% was compressed into a narrow column on the right side of the blackboard.

He pasted the old and new sets of data side by side, using a red pencil to draw the resistance variation of the components and a blue pencil to draw the conversion loss. The difference caused by crystal orientation control could also be seen from the other side of the blackboard.

Wu Hanzhang stood in front of the diagram, took the cigarette from behind his ear, lit it with a match, took only one puff, and then checked the component numbers, germanium sheet numbers, and cutting positions one by one while holding the cigarette between his fingers.

He shuffled the twelve process cards and checked them again, then pulled out the electrical pulse paper tape and stylus pressure records to confirm that the formation conditions continued the standards of the previous round before writing the new results into the preliminary research plan.

The words "Laue orientation method has been verified" appeared next to the device dispersion column. Wu Hanzhang then crossed out 40% and changed the stage data to 6%.

"That's more like a matching diode." He pushed the proposal back to Jiang Ming. The cigarette ash fell onto the edge of the enamel mug and was wiped away by Old Sun with a cloth.

Jiang Ming selected two devices with the closest resistance ratios and paired them according to the requirements of a balanced mixer, keeping the difference in conversion loss within the interpretation range of the existing test bench.

Previously, the zero-generation sample tubes could only prove that domestically produced germanium materials could form working junctions. Only after directional cutting was completed could the batch consistency of the devices truly enter a controllable process stage.

Fang Xudong bound eight Laue films, turntable calibration records, and data for twelve devices into a booklet, which was then sent to the semiconductor research group through internal exchange channels. The cover indicated that the directional cutting process was being verified.

That afternoon, the secure phone in office 502 rang. Wu Hanzhang answered for a few words and then handed the receiver to Jiang Ming. On the other end, the sound of Wang Shouwu flipping through documents could be heard.

"I've seen the raw data for the 6% you reported, and the polarization directions of the twelve plates match up." Wang Shouwu stopped turning the page and then proposed a cross-validation.

The semiconductor research group has a standard[111] orientation seed crystal. The original orientation record came from foreign equipment. Wang Shouwu is preparing to cut a small section and send it to 502 to re-photograph the Laue film using a temporary device.

"You seal the measured deflection angle separately, and I will also seal the original records here first. We will unseal them and compare them after both sides have finished the calculations. We will also check the system angle difference caused by the tube source and sample holder."

Jiang Ming looked at the Laue geometry diagram on the wall and replied, "Okay, mark the sample end face and the original orientation datum together. After exposure, first measure the deviation of the central hole, and then calculate the spindle direction."

After hanging up the phone, Fang Xudong added a standard seed crystal column to the verification plan. The resources provided by the semiconductor research group have been extended from germanium materials and high-purity seed crystals to directional standard components.

As it was nearing the end of the workday, Wu Hanzhang returned from the factory with a canvas briefcase containing the approval for K-band pre-research funding and three additional priority production batch numbers on the resource guarantee page.

Waveguide components, detector test benches, and high-frequency signal sources were all included in the factory's special project sequence. Director Zhang also noted in the margin that the passive reception records in the Aksai direction were included in the pre-research progress reference.

Wu Hanzhang locked the funding approval and the 6% surplus report together in the safe. Before closing the door, he turned back and asked, "The materials are approved, the components are half approved, when will the double-diffused triode process begin?"

Jiang Ming opened the kraft paper notebook and listed the silicon triode diffusion process accumulated during the Yuanlei-2 period on the left page, and the temperature, impurity source, and junction depth control required for germanium plate double diffusion on the right page.

"First, we used the fifth batch of directional slices to make two groups of diffusion samples for boron and phosphorus. The temperature was lowered to the 600-degree range, and the time was extended. In the first round, we only looked at the junction depth and the masking boundary."

Fang Xudong added a list of diffusion furnace, quartz boat, protective gas, and surface resistivity measurement, and then circled the masking film separately, leaving a section for inspection after heating.

The thermal oxide film used in silicon processes can withstand diffusion at temperatures above 1,000 degrees Celsius. What happens to the oxide layer on the surface of germanium wafers at temperatures around 600 degrees Celsius? The process card in hand at 502 doesn't yet provide a practical answer.

Jiang Ming wrote the first batch of test piece numbers in the lower right corner of the blackboard. The six percent left by Laue orientation had just been archived, and another process threshold closer to the germanium surface had been placed into the diffusion furnace.